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SEM FEG JEOL 6500F
High resolution Scanning Electron Microscopy, with Field Emission Gun.
A 18 bit resolution pattern generator has been applied to this microscope,
for high resolution electron beam lithography.
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PATTERN GENERATOR for E-BEAM LITHOGRAPHY
The hardware and the software of a pattern generator, with a 18 bit resolution,
has been developed by the University of Pisa. Features smaller than 10 nm can be fabricated by e-beam
lithography, by means of this pattern generator applied to the SEM-FEG.
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ATOMIC FORCE MICROSCOPE Psia 100
Measurement of sub-nanometric thicnkesses: graphene flakes characterization,
surface roughness, etc.
Moreover, this AFM can perform lithography for local oxidation. An environment with controlled humidity
is provided.
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Rapid Thermal Annealer JIPELEC
Thermal annealing and thermal oxidation of silicon.
Silicon doping through solid source.
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Thermal evaporator with high precision microbalance
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Clean and Fume cupboards
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Measurement station
Probe Station, low temperature cryostat (< 1 K) and high
precision instrumentation.
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